Measurement head VK-X4100

Model

VK-X4100

Type

Measurement head

Total magnification

42× to 28800× ^*1

Field of view

11 to 7398 µm

Measurement principle

Laser confocal, Focus variation, White light interferometry, Spectral interference

Laser wavelength

Semiconductor laser, 404 nm

Max. laser measurement speed

Surface: 125 Hz, Line: 7900 Hz ^*2

Max. laser output

1.0 mW

Laser class

Class 2 (IEC60825-1)

Laser light-receiving element

16-bit photomultiplier

White light source

White LED

White-light-receiving element

High-definition colour CMOS

Laser confocal

Height display resolution

0.1 nm

Height repeatability σ

10×: 100 nm, 20×: 40 nm, 50×: 12 nm

Height accuracy

0.2+L/100 µm or less ^*3

Width display resolution

0.1 nm

Width repeatability 3σ

10×: 200 nm, 20×: 100 nm, 50×: 40 nm

Width accuracy

Measured value ±2% or less ^*3

Focus variation

Height display resolution

0.1 nm

Height repeatability σ

5×: 500 nm, 10×: 100 nm, 20×: 50 nm, 50×: 20 nm

Height accuracy

0.2+L/100 µm or less ^*3

Width display resolution

0.1 nm

Width repeatability 3σ

5×: 400 nm, 10×: 400 nm, 20×: 120 nm, 50×: 50 nm

Width accuracy

Measured value ±2% or less ^*3

White light interferometry

Height display resolution

0.01 nm

Width display resolution

0.1 nm

Surface topography repeatability

0.08 nm ^*4

Repeatability of RMS

0.008 nm ^*4

Spectral interference film thickness measurement

Repeatability σ

0.1 nm ^*4

Accuracy

±0.6% ^*4

Optical observation

Number of pixels

5.6 million

Revolver

6-hole electric revolver

Ring illumination lens

2.5×, 5×, 10×

Optical zoom

1 to 8×

Power supply

Power voltage

100 to 240 VAC, 50/60 Hz

Power consumption

150 VA

Environmental resistance

Ambient temperature

+15 to 28°C

Relative humidity

20 to 80% RH (No condensation)

Weight

Approx. 13 kg